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Precise thin film deposition for solar cells, TCO, and semiconductor applications.
The UAM2000 is an ultrasonic spray pyrolysis system designed for uniform deposition of functional films at the nano and micron scale. With operating frequencies from 25 to 180 kHz, it offers exceptional control over droplet size (18-200 μm), enabling precise film thickness from 20 nm to 100 μm. This system is ideal for solar cell manufacturing, TCO production, and advanced materials research.
| Parameter | Value |
|---|---|
| Operating frequency | 25–180 kHz |
| Flow rate | 0.001–50 mL/min |
| Droplet size | 18–200 μm |
| Film thickness | 20 nm–100 μm |
| Pyrolysis temperature | 400–1200°C |
| Particle size | 20 nm–5 μm |
| Carrier gas | Air / Nitrogen / Oxygen |
| Deposition process | Ultrasonic Spray Pyrolysis (USP) |
Model UAM2000 is available with optional programmable motion stages and integrated drying modules for continuous processing. Contact us for custom configurations.
Constructed from stainless steel and titanium alloy for enhanced durability and chemical resistance, suitable for corrosive precursor solutions.
Industry: Specialty chemical & environmental catalytic material R&D enterprise (Australia)
Application: Batch preparation of multi-metal composite catalytic powder
Result: Raw material utilization above 92%, batch error reduced from 15% to 4.5%, and R&D iteration efficiency increased by 70%.
A: MOQ is 1 unit.
A: FOB, CIF, and DDP.
A: Yes, the model UAM2000 is included in the CE attestation of compliance (certificate number TRCN-26118HCU02).
A: Yes, temperature range is 400-1200°C with precise control.
A: Air, Nitrogen, and Oxygen.
A: 20 nm to 100 μm.
A: Yes, due to stainless steel and titanium alloy construction.
A: 30% T/T deposit upon order confirmation, 70% balance against B/L copy.
For more details, contact Beaty Mao at market2@cheersonic.com or +86 133-7254-0303.
Image 1: UAM2000 ultrasonic spray pyrolysis system main unit.
Image 2: UAM2000 ultrasonic spray pyrolysis system in operation.